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Hafnium targets are made of high purity hafnium metal with good thermal conductivity, mechanical strength and chemical stability.
Applications:
1. Hafnium targets are widely used in physical evaporation deposition, magnet and other technologies for the preparation of a variety of thin-film materials, such as oxides, nit-rides, sidelines, and metals.
2. In semiconductor manufacturing, hafnium targets are commonly used to prepare thin film materials such as silicon, silicon nit-ride, alumina, zirconia, and so on.
3. In display manufacturing, hafnium targets are commonly used to prepare transparent electrode materials such as indium tin oxide (ITO) and zinc oxide (ZnO).
4. Hafnium targets play an important role in semiconductor and display manufacturing due to their high purity and good performance. The demand for hafnium targets will continue to increase in industrial development.