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Molecular formula: Ti

Purity: 99.9 per cent

CAS: 7440-32-6

Molar mass: 47.867

Density: 4.506 g-cm-3

Melting point: 1941 K, 1668 °C, 3034 °F

Boiling point : 3560 K, 3287 °C, 5949 °F

Applications:

1. High-purity titanium is mainly used as a gas-absorbing material in semiconductor materials and ultra-high vacuum devices.

2. High-purity titanium has gas-absorbing properties, especially hydrogen, CH4, and Co2 gases, so it can be widely used in high-vacuum and ultra-high-vacuum systems.

3. The sputtering of high-purity titanium to make line networks makes these integrated parts extraordinarily light, thin, small and densely wired. High purity titanium targets can also be used as barrier layer metals.